Wear and oxidation behavior of reactive sputtered δ-(Ti,Mo)N films deposited at different nitrogen gas flow rates

S. Komiyama, Y. Sutou, K. Oikawa, J. Koike, M. Wang, M. Sakurai

研究成果: Article査読

11 被引用数 (Scopus)

抄録

The wear properties of δ-(Ti,Mo)N films deposited at low and high nitrogen gas flow rates (fN2) were investigated. The film at fN2=2.0 sccm showed better adhesive wear resistance than that at fN2=0.3 sccm. Such improvement in the film at fN2=2.0 sccm was due to the formation of Mo oxide debris by wear oxidation. It was found that Mo oxidation more easily occurred in the film at fN2=2.0 sccm than in the film at fN2=0.3 sccm. Thermodynamic consideration indicated that since the activity of Ti in δ-(Ti,Mo)N decreases with increasing N content, Mo oxidation is promoted in the film at fN2=2.0 sccm, which leads to better wear properties.

本文言語English
ページ(範囲)32-39
ページ数8
ジャーナルTribology International
87
DOI
出版ステータスPublished - 2015 7

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

フィンガープリント 「Wear and oxidation behavior of reactive sputtered δ-(Ti,Mo)N films deposited at different nitrogen gas flow rates」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル