Waveguide-mode interference lithography technique for high contrast subwavelength structures in the visible region

Kanta Kusaka, Hiroyuki Kurosawa, Seigo Ohno, Yozaburo Sakaki, Kazuyuki Nakayama, Yuto Moritake, Teruya Ishihara

研究成果: Article査読

11 被引用数 (Scopus)

抄録

We explore possibilities of waveguide-mode interference lithography (WMIL) technique for high contrast subwavelength structures in the visible region. Selecting an appropriate waveguide-mode, we demonstrate high contrast resist mask patterns for the first time. TM1 mode in the waveguide is shown to be useful for providing a three-dimensional structure whose cross section is checkerboard pattern. Applying our WMIL technique, we demonstrate 1D, 2D and 3D subwavelength resist patterns that are widely used for the fabrication of metamteterials in the visible region. In addition to the resist patterns, we demonstrate a resonance at 1.9 eV for a split tube structure experimentally.

本文言語English
ページ(範囲)18748-18756
ページ数9
ジャーナルOptics Express
22
15
DOI
出版ステータスPublished - 2014

ASJC Scopus subject areas

  • 原子分子物理学および光学

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