Wave Propagation and Plasma Uniformity in An Electron Cyclotron Resonance Plasma

研究成果: Article査読

19 被引用数 (Scopus)

抄録

This study examined microwave propagation and plasma uniformity in the mode of introduced microwaves and the discharged gases. TEn-mode microwaves are almost all absorbed close to the electron cyclotron resonance (ECR) region. Conversely, TM01-mode microwaves are mainly absorbed upstream from the ECR region. Accordingly, in the case of TEirmode microwave, the plasma uniformity strongly depends on the magnetic field profiles and the position of the resonance region. TMormode microwave plasma is generated uniformly at any magnetic field and any position. Moreover, the microwave propagation states are changed on the discharged gases. TEn-mode microwaves are gradually absorbed upstream from the ECR region in CHF3 gas plasma, whereas N2gas plasma causes microwave absorption close to the ECR region. Then, the CHF3 plasma results in a uniform ion current density, in comparison with the result for N2 gas plasma. This is considered to be due to electron temperature differences in the plasmas.

本文言語English
ページ(範囲)2572-2576
ページ数5
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
11
5
DOI
出版ステータスPublished - 1993 1 1
外部発表はい

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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