This study examined microwave propagation and plasma uniformity in the mode of introduced microwaves and the discharged gases. TEn-mode microwaves are almost all absorbed close to the electron cyclotron resonance (ECR) region. Conversely, TM01-mode microwaves are mainly absorbed upstream from the ECR region. Accordingly, in the case of TEirmode microwave, the plasma uniformity strongly depends on the magnetic field profiles and the position of the resonance region. TMormode microwave plasma is generated uniformly at any magnetic field and any position. Moreover, the microwave propagation states are changed on the discharged gases. TEn-mode microwaves are gradually absorbed upstream from the ECR region in CHF3 gas plasma, whereas N2gas plasma causes microwave absorption close to the ECR region. Then, the CHF3 plasma results in a uniform ion current density, in comparison with the result for N2 gas plasma. This is considered to be due to electron temperature differences in the plasmas.
|ジャーナル||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|出版ステータス||Published - 1993 1 1|
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films