Water adsorption on α-Fe2O3 (0001) at near ambient conditions

Susumu Yamamoto, Tom Kendelewicz, John T. Newberg, Guido Ketteler, David E. Starr, Erin R. Mysak, Klas J. Andersson, Hirohito Ogasawara, Hendrik Bluhm, Miquel Salmeron, Gordon E. Brown, Anders Nilsson

研究成果: Article査読

206 被引用数 (Scopus)

抄録

We have investigated hydroxylation and water adsorption on α Fe 2O3(0001) at water vapor pressures up to 2 Torr and temperatures ranging from 277 to 647 K (relative humidity (RH) < 34%) using ambient-pressure X-ray photoelectron spectroscopy (XPS). Hydroxylation occurs at the very low RH of 1 × 10-7 % and precedes the adsorption of molecular water. With increasing RH, the OH coverage increases up to one monolayer (ML) without any distinct threshold pressure. Depth profiling measurements showed that hydroxylation occurs only at the topmost surface under our experimental conditions. The onset of molecular water adsorption varies from ∼2 ×10-5 to ∼4 ?10-2 % RH depending on sample temperature and water vapor pressure. The coverage of water reaches 1 ML at ∼15% RH and increases to 1.5 ML at 34% RH.

本文言語English
ページ(範囲)2256-2266
ページ数11
ジャーナルJournal of Physical Chemistry C
114
5
DOI
出版ステータスPublished - 2010 2月 11
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • エネルギー(全般)
  • 物理化学および理論化学
  • 表面、皮膜および薄膜

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