We present a varifocal scanning micromirror fabricated from a silicon-on-insulator wafer. The varifocal scanning micromirror consists of a varifocal mirror with a rotational scanning function. The scanner and varifocal mirror are driven by comb and parallel-plate electrostatic actuators, respectively. The mirror rotates 5.5 ° at 45 V in static mode. The curvature of the varifocal mirror is changed from-4 m -1 (-128-mm focal length) to m -1 (mm focal length) by applying a voltage from 0 to 50 V. It is confirmed that the lateral position and spot size of the reflected laser beam from the varifocal scanning micromirror are changed simultaneously. Moreover, confocal sensing is demonstrated using a fiber-optic system with the proposed mirror.
|ジャーナル||Journal of Microelectromechanical Systems|
|出版ステータス||Published - 2012|
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