Vacancy formation energy in Czochralski-grown Si crystals determined by a quenching method

Masashi Suezawa, Naoki Fukata, Jan Vanhellemont, Ichiro Yonenaga

研究成果: Article査読

4 被引用数 (Scopus)

抄録

The vacancy formation energy in Czochralski-grown (Cz-) Si crystals was determined by applying a new quenching method. In this method, the optical absorption due to hydrogen atoms bound to vacancies is measured to estimate the vacancy concentration. In contrast with floating-zone grown Si crystals, one more optical absorption peak other than 2223 cm-1 peak was observed at about 2120 cm-1. The defects responsible for the 2120 cm -1 peak are proposed to be VOH4 and VO2H 4, inferring from the Voronkov-Falster model on grown-in defects in Cz-Si crystals. The vacancy formation energy estimated from the quenching temperature dependence of the integrated intensity of the 2120 cm-1 peak is about 2.3 eV. After taking the contribution from vacancies generated in the perfect crystal part into account, the formation energy is determined to be approximately 1.5 eV. Such small formation energy compared to that (3.85 eV) in high-purity crystals is thought to be due to a strong interaction between a vacancy and an oxygen atom.

本文言語English
論文番号083531
ジャーナルJournal of Applied Physics
110
8
DOI
出版ステータスPublished - 2011 10 15

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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