UV-assisted intermittently-spinning ozone steam etching of SU-8 for micromolding process

Shinya Yoshida, Kei Suzuki, Masayoshi Esashi, Shuji Tanaka

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

This study reports on the usability of ultraviolet (UV)-assisted ozone steam etching for SU-8 removal in micromolding process. SU-8 is etched at a rate greater than 100 nm/min by intermittently rotating a substrate on a spinner with UV irradiation to spin out etching products. Its complete removability was also verified by analyzing the substrate surface after the ozone steam etching of SU-8 via scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). In a micromolding process, non-swelling removal of a 20-μm-thick SU-8 mold successfully left electroplated mushroom microstructures without destroying or residue. Such a structure cannot be released by conventional resist strippers, because it is lifted up due to resist swelling. Therefore, our new resist removal method is clearly demonstrated to have the usability and applicability for the micromolding process.

本文言語English
ホスト出版物のタイトル2013 Transducers and Eurosensors XXVII
ホスト出版物のサブタイトルThe 17th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS 2013
ページ1621-1624
ページ数4
DOI
出版ステータスPublished - 2013 12月 1
イベント2013 17th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS 2013 - Barcelona, Spain
継続期間: 2013 6月 162013 6月 20

出版物シリーズ

名前2013 Transducers and Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS 2013

Other

Other2013 17th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS 2013
国/地域Spain
CityBarcelona
Period13/6/1613/6/20

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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