Uniform electron cyclotron resonance plasma generation for precise ULSI Patterning

Seiji Samukawa, Tsuyoshi Nakamura, Toshinori Ishida, Akihiko Ishitani

研究成果: Article査読

5 被引用数 (Scopus)

抄録

Microwave perturbation results in lower microwave absorption because of plasma vibrations and pulses in an electron cyclotron resonance (ECR) plasma. Moreover, the parabolic 875 G equimagnetic field and the nonuniform magnetic field gradient causes nonuniform microwave absorption. Then, magnetohydrodynamic (MHD) plasma instability is generated in the ECR plasma. Accurate control of magnetic field profiles and microwave conditions for uniform and efficient microwave absorption is essential to the achievement of stable ECR plasma generation for precise anisotropic etching.

本文言語English
ページ(範囲)L774-L776
ジャーナルJapanese journal of applied physics
31
6
DOI
出版ステータスPublished - 1992 6
外部発表はい

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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