Tribological effects of brush scrubbing in post chemical mechanical planarization cleaning on electrical characteristics in novel non-porous low-k dielectric fluorocarbon on Cu interconnects

Xun Gu, Takenao Nemoto, Yugo Tomita, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi

研究成果: Article

7 引用 (Scopus)

フィンガープリント Tribological effects of brush scrubbing in post chemical mechanical planarization cleaning on electrical characteristics in novel non-porous low-k dielectric fluorocarbon on Cu interconnects' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

Engineering & Materials Science

Physics & Astronomy