Transport of heavily boron-doped synthetic semiconductor diamond in the hopping regime

Toshimaro Sato, Kazutoshi Ohashi, Hiroyuki Sugai

研究成果: Article査読

54 被引用数 (Scopus)

抄録

We report electrical transport measurements of synthetic diamonds doped with boron about 100 ppm. The resistivity has been measured in the temperature range 20-300 K by the van der Pauw method. We have also investigated infrared absorption coefficient at room temperature. Furthermore, we have studied the effect of (Formula presented) ion irradiations with 150 MeV which introduce donor defects and also the influence of the annealing after the irradiation. The key features of the present measurement are as follows: (i) The observed temperature dependence of resistivity shows characteristic features of the variable-range-hopping (VRH). A crossover from (Formula presented) behavior of Mott VRH to the (Formula presented) form of Efros VRH is found to occur at 100 K. (ii) Below 50 K we have observed the hard gap (Formula presented) form. The width of the hard gap is about 10 meV. (iii) The experimental results are quantitatively explained by the theory of VRH. (iv) The observed width of the optical hard gap is equal to that of the hard gap obtained from resistivity. (v) The annealing effects appear only in the hard gap region and do not appear in the variable-range-hopping region. This result leads to the speculation that the hard gap is weakened by the lattice defects.

本文言語English
ページ(範囲)12970-12976
ページ数7
ジャーナルPhysical Review B - Condensed Matter and Materials Physics
61
19
DOI
出版ステータスPublished - 2000

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

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