Transient response of the emission signal controlled by pulsated bias current in pulsed radio-frequency glow discharge optical emission spectrometry

Yoko Nunome, Kenji Kodama, Kikuyasu Sasaki, Kazuaki Wagatsuma

研究成果: Article査読

2 被引用数 (Scopus)

抄録

The objective of this paper is to suggest a new method for controlling temporal response of the emission signal from a pulsed radio-frequency (RF) glow discharge plasma for optical emission spectrometry. It is a noticeable feature that the emission profile accompanies a transient stage in the pulsed operation, appearing as a pre-peak which sometimes becomes 10–20 times as large as the plateau-stage intensity. Therefore, it is worth studying how the spike-like transient signal can be modified to a smooth response following the square-wave timing signal by using any experimental procedure. For this purpose, a phenomenon regarding self-bias voltage in RF plasma was focused on. The self-bias voltage is induced near the RF-loaded electrode, and then, a bias current can be introduced through an electric circuit including the plasma body by connecting an external electric device with the glow discharge plasma source. The bias current could be also pulsated, while it was synchronized with the pulsed RF plasma. Larger pulses of the bias current could change the characteristics of the plasma for atomic emission spectrometry, extending the size of the RF plasma as well as enhancing the emission intensity, which enabled the plateau stage to become more prominent in the pulsed emission profile. Several experimental parameters, such as an amplitude of the bias current, duty ratios of both the RF power and the bias current, and a phase shift between them, were investigated to obtain a plateau-like transient response of the emission signal. It was found that the phase-shift angle should be regulated between timing pulses of the RF voltage and the bias current.

本文言語English
ページ(範囲)50-56
ページ数7
ジャーナルSpectrochimica Acta - Part B Atomic Spectroscopy
146
DOI
出版ステータスPublished - 2018 8月

ASJC Scopus subject areas

  • 分析化学
  • 原子分子物理学および光学
  • 器械工学
  • 分光学

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