This study examines modulated electron cyclotron resonance (ECR) plasma discharge occurring within a few tens of μs. It can control the generation of reactive species in plasmas. Reactive species are measured by an actinometric optical emission spectroscopy in the pulsed plasma. Good correlation is found between the density ratio of CF2 radicals and F atoms in the CHF 3 plasma, and the combination of the pulse duration and pulse intervals. These characteristics are explained by the dependence of reactive species generation in ECR plasma on a time within a few tens of μs. This method provides for controlling the polymerization during SiO2 etching.
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