Three-dimensionally controlled ion milling for reflection phase manipulation of EUV multilayer mirrors

T. Tsuru, Tadashi Hatano, M. Yamamoto

    研究成果: Conference contribution

    2 被引用数 (Scopus)

    抄録

    For accurate nm-figure error correction of EUV multilayer mirror optics, a three-dimensionally controlled ion milling method was developed. To demonstrate the reflection phase manipulation of an EUV multilayer, 10 periods of a 40-period Mo/Si multilayer were partially removed. A partially milled Mo/Si multilayer with a contact double slit was successfully fabricated for interference fringe observations, which were carried out using a Young's EUV interferometer with a reflection configuration. The fringe pattern revealed a small reflection phase change after multilayer surface milling. EUV interferometry results demonstrated the effectiveness of the proposed method for sub-nanometer digital wavefront error correction in the case of multilayer mirror optics used in diffraction-limited imaging.

    本文言語English
    ホスト出版物のタイトル10th International Conference on X-Ray Microscopy
    ページ180-183
    ページ数4
    DOI
    出版ステータスPublished - 2010 12 1
    イベント10th International Conference on X-Ray Microscopy - Chicago, IL, United States
    継続期間: 2010 8 152010 8 20

    出版物シリーズ

    名前AIP Conference Proceedings
    1365
    ISSN(印刷版)0094-243X
    ISSN(電子版)1551-7616

    Other

    Other10th International Conference on X-Ray Microscopy
    国/地域United States
    CityChicago, IL
    Period10/8/1510/8/20

    ASJC Scopus subject areas

    • 物理学および天文学(全般)

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