For rejection of unwanted background component in the reflection spectrum of EUV multilayer mirrors, thin film transmission filters of Mo, Zr, and Be were evaluated with a laser produced plasma EUV source and an imaging plate detector. It is found that in addition to a standard Zr filter, a Mo filter has good rejection characteristics. In particular, for multilayer mirror use at a large angle of incidence such as the polarizing angles around 45°, Mo shows better rejection characteristics than Zr. It is also confirmed that Be transmits non-ignorable amount of UV background.
|ジャーナル||Journal of Electron Spectroscopy and Related Phenomena|
|出版ステータス||Published - 2005 6|
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Physical and Theoretical Chemistry