Thickness measurements on transparent substrates based on reflection ellipsometry. I. Optical effects of high-refractive-index additional layers

Soichi Otsuki, Koji Ohta, Kaoru Tamada, Shin Ichi Wakida

研究成果: Article査読

6 被引用数 (Scopus)

抄録

Theoretical studies were conducted for thickness measurements using transparent substrates on the external and internal reflection configurations. For three-phase systems consisting of ambient, film, and substrate, the refractive index of the substrate could be optimized to obtain the high sensitivity of an ellipsometric quantity Δ to the film thickness and the small susceptibility of Δ to errors in the incident angle. It was shown that the combination of an ordinary glass substrate and an additional dielectric layer with an appropriate layer thickness works as a synthetic high-index single substrate (SHIS). The optical effect of the combination was approximately described by use of the effective refractive index of SHIS. A method to select the refractive index of the additional layer was also given.

本文言語English
ページ(範囲)5910-5918
ページ数9
ジャーナルApplied optics
44
28
DOI
出版ステータスPublished - 2005 10 1
外部発表はい

ASJC Scopus subject areas

  • 原子分子物理学および光学
  • 工学(その他)
  • 電子工学および電気工学

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