Thickness distribution in thin films

Takeo Hattori

    研究成果: Article査読

    6 被引用数 (Scopus)

    抄録

    A thickness distribution function is used to describe the non-uniformity of thickness in thin films. A method to determine the thickness distribution function is proposed and applied to r.f. diode-sputtered ultrathin films of platinum deposited onto liquid-nitrogen-cooled quartz substrates. The thickness distribution thus determined can be understood in terms of the completely random deposition of platinum particles of 10 Å thickness. The inelastic mean free path of electrons in platinum is determined to be 9.0 Å for an electron energy of nearly 1168 eV.

    本文言語English
    ページ(範囲)47-58
    ページ数12
    ジャーナルThin Solid Films
    46
    1
    DOI
    出版ステータスPublished - 1977 10 3

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

    フィンガープリント 「Thickness distribution in thin films」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

    引用スタイル