Thermodynamic analysis for the chemical vapour deposition of non-stoichiometric titanium carbides

Takashl Goto, Chorn Cherng Jiang, Toshio Hirai

研究成果: Article査読

7 被引用数 (Scopus)

抄録

Non-stoichiometric titanium carbide (TiCx) plates were prepared by the chemical vapour deposition of TiCl4CCl4H2 system. The relationship between deposition conditions and the composition ratio x was established experimentally and examined through thermodynamic calculations. The composition ratio x decreased with increasing deposition temperature and source gas ratio [ CCl4] [TiCl4 + CC14], agreeing well with the thermodynamic predictions. The experimentally obtained values of x were slightly smaller than the calculated values. This difference was explained by a kinetic reason.

本文言語English
ページ(範囲)231-236
ページ数6
ジャーナルJournal of the Less-Common Metals
159
C
DOI
出版ステータスPublished - 1990 4 1

ASJC Scopus subject areas

  • Engineering(all)

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