Thermally poled silicate thin films with large second-harmonic generation

O. Sugihara, M. Nakanishi, H. Fujimura, C. Egami, N. Okamoto

研究成果: Article査読

12 被引用数 (Scopus)

抄録

Ge- and Ti-doped silica thin films were prepared upon various substrates by solgel processing and rf sputtering. Large second-harmonic generation was measured from thermally poled thin-film samples. The origin of nonlinearity and its distribution from thermally poled silicate thin films were investigated. Moreover, we measured the stability of the nonlinearity of a rf-sputtered germanosilicate thin film upon a silica glass substrate against heat and intense laser light sufficient for the fabrication of waveguide-type nonlinear optical devices.

本文言語English
ページ(範囲)421-425
ページ数5
ジャーナルJournal of the Optical Society of America B: Optical Physics
15
1
DOI
出版ステータスPublished - 1998 1月
外部発表はい

ASJC Scopus subject areas

  • 統計物理学および非線形物理学
  • 原子分子物理学および光学

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