TY - GEN
T1 - Thermal conductivity of 10 nm-diameter silicon nanowires array fabricated by bio-template and neutral beam etching
AU - Kikuchi, Akiou
AU - Yao, Akifumi
AU - Mori, Isamu
AU - Yamashita, Ichiro
AU - Ono, Takahito
AU - Samukawa, Seiji
PY - 2016/11/21
Y1 - 2016/11/21
N2 - In this paper, we present the fabrication and thermal conductivity measurements of a 10 nm-diameter Si nanowires (SiNWs) array for thermoelectric (TE) devices applications. The SiNWs were fabricated by bio-template and neutral beam etching techniques. Then, the SiNWs were embedded into spin-on-glass (SOG) for the measurement of the thermal conductivity. The measured thermal conductivities of the SiNWs with lengths of 50 nm and 100 nm were 2.1 ± 0.6 W/mK and 9.5 ± 1.4 W/mK, respectively.
AB - In this paper, we present the fabrication and thermal conductivity measurements of a 10 nm-diameter Si nanowires (SiNWs) array for thermoelectric (TE) devices applications. The SiNWs were fabricated by bio-template and neutral beam etching techniques. Then, the SiNWs were embedded into spin-on-glass (SOG) for the measurement of the thermal conductivity. The measured thermal conductivities of the SiNWs with lengths of 50 nm and 100 nm were 2.1 ± 0.6 W/mK and 9.5 ± 1.4 W/mK, respectively.
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U2 - 10.1109/NANO.2016.7751300
DO - 10.1109/NANO.2016.7751300
M3 - Conference contribution
AN - SCOPUS:85006870998
T3 - 16th International Conference on Nanotechnology - IEEE NANO 2016
SP - 505
EP - 507
BT - 16th International Conference on Nanotechnology - IEEE NANO 2016
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 16th IEEE International Conference on Nanotechnology - IEEE NANO 2016
Y2 - 22 August 2016 through 25 August 2016
ER -