The selective area deposition of diamond films

Hongwu Liu, Chunxiao Gao, Guangtian Zou, Xun Li, Chengxin Wang, Chao Wen

研究成果: Article査読

3 被引用数 (Scopus)

抄録

By selectively seeding, polycrystalline diamond films have been patterned on mirror-polished Si substrate using hot-filament chemical vapor deposition. Results show high selectivity and high quality in patterned diamond films deposited at 0.05% CH4/H2 concentration and at the growth rate of 2.6 μm/h. The selective area deposition (SAD) method is easy to be applied to a large and a different substrate.

本文言語English
ページ(範囲)1323-1324
ページ数2
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
39
3 A
DOI
出版ステータスPublished - 2000
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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