抄録
A series of nanocrystalline or amorphous single solid solutions of W-Ta alloys are prepared by D.C. magnetron sputtering. The passivation behavior of these alloys is studied by immersion test, electrochemical measurements and X-ray photoelectron spectroscopy (XPS) analyhsis. The W-Ta alloys are passivated sponstaneously and show significantly high corrosion resistance in 12 M HCI at 30°C. Their corrosion rates are about two orders of magnitude lower than that of sputter-deposited tungsten and are lower than that of sputter-deposited tantalum. XPS analysis shows that tantalum is concentrated in both the air-formed films and the passive films formed spontaneously on the alloys after long time immersion in 12 M HCI. The surface films are composed of double oxhydroxides of Ta5+ and W4+ ions. The formation of spontaneous passive film composed of a double oxyhydroxide of tungsten and tantalum ions is responsible for high corrosion resistance of the W-Ta alloys in concentrated hydrochloric acid solution.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 757-779 |
| ページ数 | 23 |
| ジャーナル | Corrosion Science |
| 巻 | 40 |
| 号 | 4-5 |
| DOI | |
| 出版ステータス | Published - 1998 4 1 |
ASJC Scopus subject areas
- Chemistry(all)
- Chemical Engineering(all)
- Materials Science(all)