The passivation behavior of sputter-deposited W-Ta alloys in 12M HCl

J. Bhattarai, E. Akiyama, H. Habazaki, A. Kawashima, K. Asami, K. Hashimoto

研究成果: Article査読

43 被引用数 (Scopus)

抄録

A series of nanocrystalline or amorphous single solid solutions of W-Ta alloys are prepared by D.C. magnetron sputtering. The passivation behavior of these alloys is studied by immersion test, electrochemical measurements and X-ray photoelectron spectroscopy (XPS) analyhsis. The W-Ta alloys are passivated sponstaneously and show significantly high corrosion resistance in 12 M HCI at 30°C. Their corrosion rates are about two orders of magnitude lower than that of sputter-deposited tungsten and are lower than that of sputter-deposited tantalum. XPS analysis shows that tantalum is concentrated in both the air-formed films and the passive films formed spontaneously on the alloys after long time immersion in 12 M HCI. The surface films are composed of double oxhydroxides of Ta5+ and W4+ ions. The formation of spontaneous passive film composed of a double oxyhydroxide of tungsten and tantalum ions is responsible for high corrosion resistance of the W-Ta alloys in concentrated hydrochloric acid solution.

本文言語English
ページ(範囲)757-779
ページ数23
ジャーナルCorrosion Science
40
4-5
DOI
出版ステータスPublished - 1998 4月

ASJC Scopus subject areas

  • 化学 (全般)
  • 化学工学(全般)
  • 材料科学(全般)

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