抄録
A series of nanocrystalline or amorphous single solid solutions of W-Ta alloys are prepared by D.C. magnetron sputtering. The passivation behavior of these alloys is studied by immersion test, electrochemical measurements and X-ray photoelectron spectroscopy (XPS) analyhsis. The W-Ta alloys are passivated sponstaneously and show significantly high corrosion resistance in 12 M HCI at 30°C. Their corrosion rates are about two orders of magnitude lower than that of sputter-deposited tungsten and are lower than that of sputter-deposited tantalum. XPS analysis shows that tantalum is concentrated in both the air-formed films and the passive films formed spontaneously on the alloys after long time immersion in 12 M HCI. The surface films are composed of double oxhydroxides of Ta5+ and W4+ ions. The formation of spontaneous passive film composed of a double oxyhydroxide of tungsten and tantalum ions is responsible for high corrosion resistance of the W-Ta alloys in concentrated hydrochloric acid solution.
本文言語 | English |
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ページ(範囲) | 757-779 |
ページ数 | 23 |
ジャーナル | Corrosion Science |
巻 | 40 |
号 | 4-5 |
DOI | |
出版ステータス | Published - 1998 4月 |
ASJC Scopus subject areas
- 化学 (全般)
- 化学工学(全般)
- 材料科学(全般)