The local structure around Ge atoms in Ge-doped magnetite thin films

Kozo Shinoda, Seishi Abe, Kazumasa Sugiyama, Yoshio Waseda

研究成果: Article査読

1 被引用数 (Scopus)

抄録

Distribution of Ge atoms between tetrahedral and octahedral sites in the spinel-type structure of Fe2.64Ge0.36O4 thin films fabricated by radio frequency sputtering with a composite target of magnetite and Ge has been investigated by extended X-ray absorption fine structure analysis. The local structural changes around the Ge atoms in the films induced by annealing at 573 and 873 K are discussed through comparison of the local structure for sintered crystalline Fe2.7Ge0.3O4 in which Ge atoms preferentially located at the tetrahedral site of the spinel-type structure. This work provides successful information on the structural change with magnetic property of the thin films as follows: the Ge atoms statistically distributed at the tetrahedral and octahedral sites of the as-synthesized films and preferentially occupied the tetrahedral site by annealing at 873 K corresponding to the increase in magnetization.

本文言語English
ページ(範囲)645-662
ページ数18
ジャーナルHigh Temperature Materials and Processes
39
1
DOI
出版ステータスPublished - 2020 1月 1

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 物理化学および理論化学

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