The K+-C60- plasma for material processing

T. Hirata, R. Hatakeyama, T. Mieno, S. Iizuka, N. Sato

研究成果: Article査読

4 被引用数 (Scopus)

抄録

A new plasma source is developed by introducing 'Buckminsterfullerene', C60, particles into a low-temperature (about 0.2 eV) potassium plasma column confined by a strong axial magnetic field, which consists of electrons, positive K+ ions and large negative C60- ions. Drastic changes in characteristics of thin films formed by using the plasma are observed in accordance with bias control of fluxes and energies of K+ and C60- ions coming into contact with substrates. It is hoped that this ultra-fine-particle plasma will be useful for producing C60-based materials with unique functions such as alkali fullerides, endohedral metallofullerenes and polymers.

本文言語English
ページ(範囲)288-292
ページ数5
ジャーナルPlasma Sources Science and Technology
5
2
DOI
出版ステータスPublished - 1996 12 1

ASJC Scopus subject areas

  • Condensed Matter Physics

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