The degradation prevention of resin materials for semiconductor manufacturing equipment by applying the ultra-high purity gas supply technology

Atsushi Hidaka, Satoru Yamashita, Naoki Tanahashi, Hidekazu Ishii, Masafumi Kitano, Yasuyuki Shirai, Tadahiro Ohrni

研究成果: Conference contribution

抄録

The production (molding) guideline to realize uhraclean resin components for semiconductor equipment has been established In this paper, we focused on the degradation behavior of resin materials for the purpose of reducing low-molecular-weight volatile contaminants concentration in resin components because the molding is carried out at high temperature and low-molecular-weight volatile contaminants are produced by thermal degradation. It was clarified that die oxygen concentration in high temperature molding environment is required to be below 1 ppm. And as the contact surface of the thermal degradation prevention for the resin material, the following surface materials are effective. 1) Passivation surface for a hydrocarbon resin. 2) Ni (nickel) surface for a fluorocarbon resin. As a result, we found the degradation prevention of the resin material can be realized until around 400°C although the degradation was observed even under 200 C if using current process condition. Therefore, low-molecular-weight volatile contaminants can be drastically reduced from resin components by using the guideline and uhraclean semiconductor equipment must be realized.

本文言語English
ホスト出版物のタイトルUltra Clean Processing of Silicon Surfaces VII, UCPSS 2004 - Proceedings of the 7th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS)
出版社Trans Tech Publications Ltd
ページ255-258
ページ数4
ISBN(印刷版)390845106X, 9783908451068
DOI
出版ステータスPublished - 2005
イベント7th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2004 - Brussels, Belgium
継続期間: 2004 9 202004 9 22

出版物シリーズ

名前Solid State Phenomena
103-104
ISSN(印刷版)1012-0394

Other

Other7th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2004
国/地域Belgium
CityBrussels
Period04/9/2004/9/22

ASJC Scopus subject areas

  • 原子分子物理学および光学
  • 材料科学(全般)
  • 凝縮系物理学

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