The compositional and optical characterizations of InGaAsN alloy semiconductor grown by MOVPE

Sakuntam Sanorpim, Fumihiro Nakajima, Ryuji Katayama, Kentaro Onabe, Yashihiro Shiraki

研究成果: Conference article査読


We report on the compositional and optical investigation of InGaAs(N) alloy films grown on GaAs (001) substrates by low-pressure (60 Torr) metalorganic vapor phase epitaxy (MOVPE). The alloy films with the room-temperature photoreflactance (PR) signal (Eo transition) wavelength range of 0.98-1.36 μm have been grown. The variation in PL characteristics of the InGaAs(N) alloy films has been investigated as a function of alloy composition, excitation power and temperature. At low temperatures (T<100K), the PL spectra with several sub-peaks include localization emission as well as near-band-edge emission. On the other hand, the room-temperature PL properties for InxGa1-xAs1-yNy (x = 10.5% and 17.0% and y < 2%) are excellent with a single near-band-edge emission peak corresponding to their own Eo transition. The evolution of PL spectra with excitation power and temperature led to an insight into the nature of the near-band-edge states. The temperature dependence of integrated PL intensity indicates the presence of a large density of non-radiative recombination centers, showing a behavior characterized by two activation energies. Our results suggest that the origin of localization in InGaAsN alloy films is the alloy inhomogeneities of both In and N, which may results in the characteristic carrier dynamics.

ジャーナルMaterials Research Society Symposium - Proceedings
出版ステータスPublished - 2002 12月 1
イベントQuantum Confined Semiconductor Nanostructures - Boston MA, United States
継続期間: 2002 12月 22002 12月 5

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学


「The compositional and optical characterizations of InGaAsN alloy semiconductor grown by MOVPE」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。