Surface plasmon characterization of positive-tone photoimaging in polymer Langmuir-Blodgett films

Masaya Mitsuishi, Tiesheng Li, Tokuji Miyashita

    研究成果: Article査読

    5 被引用数 (Scopus)

    抄録

    The surface plasmon technique was used to precisely and simultaneously record photopattern formation of p(DDA-tBVPC53) LB films. Minute changes in thickness were traced on the nanometer level. Thickness changed gradually during deep UV irradiation in air atmosphere. Combining this finding with spectroscopic observation by UV spectra gave detailed insight into photopattern formation. The etching resistance of polymer LB films was also determined.

    本文言語English
    ページ(範囲)10035-10038
    ページ数4
    ジャーナルLangmuir
    18
    25
    DOI
    出版ステータスPublished - 2002 12 10

    ASJC Scopus subject areas

    • 材料科学(全般)
    • 凝縮系物理学
    • 表面および界面
    • 分光学
    • 電気化学

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