Surface modification without desorption: Recycling of Cl on Si(100)-(2 × 1)

Koji S. Nakayama, E. Graugnard, J. H. Weaver

研究成果: Article査読

29 被引用数 (Scopus)

抄録

Chlorine-induced modification of Si(100)-(2×1) was demonstrated under conditions where Cl was recycled rather than desorbed on SiCl2. A dimer with 2SiCl, 2Cl atoms, converted to Si + SiCl2, allowing the bare Si atom to escape. The SiCl2 unit decayed through Cl diffusion at temperature below the desorption threshold allowing the second Si atom to escape. The result was terrace region with structures, a dimer vacancy and Cl. Access to this low energy pathway was controlled by Cl concentration and temperature.

本文言語English
論文番号125508
ページ(範囲)1255081-1255084
ページ数4
ジャーナルPhysical review letters
88
12
出版ステータスPublished - 2002 3月 25

ASJC Scopus subject areas

  • 物理学および天文学(全般)

フィンガープリント

「Surface modification without desorption: Recycling of Cl on Si(100)-(2 × 1)」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル