抄録
Supercritical carbon dioxide (ScCO 2 ) is a promising solvent for regeneration because of its high diffusivity into the microstructure of activated carbon and its ability to operate at a moderate temperature. In this study, we investigated a ScCO 2 cleaning method of the activated carbon used in the exhaust processor of a semiconductor manufacturing process. The ScCO 2 cleaning was carried out at temperature of 80°C, pressure of 20 MPa and regeneration time of 6.0 h. The experimental results showed the activated carbon used in the exhaust processor for a long duration could not be regenerated. Thermogravimetric analysis (TGA) showed that ScCO 2 could remove low boiling point adsorbates (100‒400°C) but not high boiling point adsorbates (400‒900°C). Analysis of the results of ScCO 2 cleaning in terms of a high boiling point ratio, defined as the proportion of high boiling point adsorbates, showed that regeneration rates of 90% and 80% respectively were achieved at high boiling ratios of 2.0% and 4.0%, suggesting that the high boiling point ratio could serve as an indicator of potential regeneration rate.
本文言語 | English |
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ページ(範囲) | 29-34 |
ページ数 | 6 |
ジャーナル | kagaku kogaku ronbunshu |
巻 | 45 |
号 | 1 |
DOI | |
出版ステータス | Published - 2019 1月 20 |
ASJC Scopus subject areas
- 化学 (全般)
- 化学工学(全般)