Subwavelength photolithography based on surface-plasmon polariton resonance

Xiangang Luo, Teruya Ishihara

研究成果: Article査読

168 被引用数 (Scopus)

抄録

The use of surface-plasmon polariton (SPP) resonance in the optical near field of a metallic mask to produce fine patterns with a resolution of subwavelength scale is proposed. Preliminary numerical simulations indicate that the critical resolution is determined mainly by the thickness of the metallic mask. The surface of the metallic mask on the illuminated side collects light through SPP coupling, and the interference of SPPs on the exit side of the metallic mask results in enhanced optical intensity with high spatial resolution, which can facilitate nanolithography efficiently by use of conventional photoresist with simple visible or ultraviolet light sources. Several schemes for sub-half-wavelength lithography based on SPPs are described. Inasmuch as the technique is not diffraction limited, nanostructures can be reproduced photolithographically.

本文言語English
ページ(範囲)3055-3065
ページ数11
ジャーナルOptics Express
12
14
DOI
出版ステータスPublished - 2004 7月
外部発表はい

ASJC Scopus subject areas

  • 原子分子物理学および光学

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