Subwavelength antireflection gratings for photovoltaic cells in visible and near-infrared wavelengths

Y. Kanamori, K. Kobayashi, H. Yugami, K. Hane

研究成果: Conference contribution

3 被引用数 (Scopus)

抄録

In this study, we have fabricated a two-dimensional antireflection subwavelength grating (SWG) on a GaSb substratefor application to a photovoltaic cell. The SWG has consisted of 350 nm period tapered grating. In the fabrication, electron beam (EB) lithography and fast atom beam (FAB) etching have been used. We have demonstrated that the SWG works well for reducing the reflection even at the temperature of 240°C. To our knowledge, the SWG is fabricated on the GaSb substrate for the first time.

本文言語English
ホスト出版物のタイトル2002 International Microprocesses and Nanotechnology Conference, MNC 2002
出版社Institute of Electrical and Electronics Engineers Inc.
ページ182-183
ページ数2
ISBN(印刷版)4891140313, 9784891140311
DOI
出版ステータスPublished - 2002
イベントInternational Microprocesses and Nanotechnology Conference, MNC 2002 - Tokyo, Japan
継続期間: 2002 11月 62002 11月 8

Other

OtherInternational Microprocesses and Nanotechnology Conference, MNC 2002
国/地域Japan
CityTokyo
Period02/11/602/11/8

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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