Sub-10-nm EB lithography using poly(α-methylstyrene) resist of molecular weight 650

S. Manako; J. Fujita; K. Tanigaki; Y. Ochiai; E. Nomura

doi:10.1109/IMNC.1998.730104

Sub-10-nm EB lithography using poly(α-methylstyrene) resist of molecular weight 650

S. Manako, J. Fujita, K. Tanigaki, Y. Ochiai, E. Nomura

研究成果: Conference contribution

本文言語	English
ホスト出版物のタイトル	Digest of Papers - Microprocesses and Nanotechnology 1998
ホスト出版物のサブタイトル	1998 International Microprocesses and Nanotechnology Conference
編集者	Hyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
出版社	Institute of Electrical and Electronics Engineers Inc.
ページ	325-326
ページ数	2
ISBN（電子版）	4930813832, 9784930813831
DOI	https://doi.org/10.1109/IMNC.1998.730104
出版ステータス	Published - 1998
外部発表	はい
イベント	1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of 継続期間: 1998 7月 13 → 1998 7月 16

出版物シリーズ

名前	Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference
巻	1998-July

Other

Other	1998 International Microprocesses and Nanotechnology Conference, MNC 1998
国/地域	Korea, Republic of
City	Kyoungju
Period	98/7/13 → 98/7/16

ASJC Scopus subject areas

材料科学（全般）
核物理学および高エネルギー物理学
コンピュータサイエンスの応用

文献へのアクセス

10.1109/IMNC.1998.730104

他のファイルとリンク

引用スタイル

Manako, S., Fujita, J., Tanigaki, K., Ochiai, Y., & Nomura, E. (1998). Sub-10-nm EB lithography using poly(α-methylstyrene) resist of molecular weight 650. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (pp. 325-326). [730104] (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.730104

Sub-10-nm EB lithography using poly(α-methylstyrene) resist of molecular weight 650. / Manako, S.; Fujita, J.; Tanigaki, K. その他.

Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. p. 325-326 730104 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July).

研究成果: Conference contribution

Manako, S, Fujita, J, Tanigaki, K, Ochiai, Y & Nomura, E 1998, Sub-10-nm EB lithography using poly(α-methylstyrene) resist of molecular weight 650. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference., 730104, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference, vol. 1998-July, Institute of Electrical and Electronics Engineers Inc., pp. 325-326, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 98/7/13. https://doi.org/10.1109/IMNC.1998.730104

Manako S, Fujita J, Tanigaki K, Ochiai Y, Nomura E. Sub-10-nm EB lithography using poly(α-methylstyrene) resist of molecular weight 650. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Institute of Electrical and Electronics Engineers Inc. 1998. p. 325-326. 730104. (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference). doi: 10.1109/IMNC.1998.730104

Manako, S. ; Fujita, J. ; Tanigaki, K. その他. / Sub-10-nm EB lithography using poly(α-methylstyrene) resist of molecular weight 650. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. pp. 325-326 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference).

@inproceedings{3e3cba9b01be4f1696a68866ed04d98d,

title = "Sub-10-nm EB lithography using poly(α-methylstyrene) resist of molecular weight 650",

author = "S. Manako and J. Fujita and K. Tanigaki and Y. Ochiai and E. Nomura",

year = "1998",

doi = "10.1109/IMNC.1998.730104",

language = "English",

series = "Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "325--326",

editor = "Yoo, {Hyung Joon} and Shinji Okazaki and Jinho Ahn and Ohyun Kim and Masanori Komuro",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 1998",

note = "1998 International Microprocesses and Nanotechnology Conference, MNC 1998 ; Conference date: 13-07-1998 Through 16-07-1998",

}

TY - GEN

T1 - Sub-10-nm EB lithography using poly(α-methylstyrene) resist of molecular weight 650

AU - Manako, S.

AU - Fujita, J.

AU - Tanigaki, K.

AU - Ochiai, Y.

AU - Nomura, E.

PY - 1998

Y1 - 1998

UR - http://www.scopus.com/inward/record.url?scp=85051421158&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85051421158&partnerID=8YFLogxK

U2 - 10.1109/IMNC.1998.730104

DO - 10.1109/IMNC.1998.730104

M3 - Conference contribution

AN - SCOPUS:85051421158

T3 - Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference

SP - 325

EP - 326

BT - Digest of Papers - Microprocesses and Nanotechnology 1998

A2 - Yoo, Hyung Joon

A2 - Okazaki, Shinji

A2 - Ahn, Jinho

A2 - Kim, Ohyun

A2 - Komuro, Masanori

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 1998 International Microprocesses and Nanotechnology Conference, MNC 1998

Y2 - 13 July 1998 through 16 July 1998

ER -