抄録
Ultra-low-power SiGe base bipolar transistors with a wedge-shaped CVD-SiO2 isolation structure and a borophosphosilicate glass (BPSG)-refilled isolation trench are presented. The SiGe base and a poly-Si/SiGe base contact were formed by selective growth in a self-aligned manner. The transistors have a very small collector capacitance (below 1 fF) and exhibit a high maximum oscillation frequency (30-65 GHz) at low current (10-100 μA). The power-delay product of an ECL ring oscillator is only 5.1 fJ/G for a 250-mV voltage swing. The maximum toggle frequency of a 1/8 static divider is 4.7 GHz at a switching current of 68 μA/FF.
本文言語 | English |
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ページ(範囲) | 245-248 |
ページ数 | 4 |
ジャーナル | Technical Digest - International Electron Devices Meeting |
出版ステータス | Published - 1996 12月 1 |
外部発表 | はい |
イベント | Proceedings of the 1996 IEEE International Electron Devices Meeting - San Francisco, CA, USA 継続期間: 1996 12月 8 → 1996 12月 11 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 凝縮系物理学
- 電子工学および電気工学
- 材料化学