Study on electron beam lithography with dye-doped polymer material

Yanlong Che, Okihiro Sugihara, Hideki Nakayama, Naomichi Okamoto

研究成果: Conference article査読

2 被引用数 (Scopus)

抄録

We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ(2) diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.

本文言語English
ページ(範囲)381-384
ページ数4
ジャーナルMolecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
316
DOI
出版ステータスPublished - 1998 1 1
イベントProceedings of the 1998 IEEE Instrumentation and Measurement Technology Conference, IMTC. Part 1 (of 2) - St.Paul, MN, USA
継続期間: 1998 5 181998 5 21

ASJC Scopus subject areas

  • 凝縮系物理学

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