Structural properties of amorphous carbon nitride films prepared by reactive rf-magnetron sputtering

Noriaki Nakayama, Yasuaki Tsuchiya, Satoru Tamada, Kouji Kosuge, Shinji Nagata, Katsumi Takahiro, Sadae Yamaguchi

研究成果: Article査読

134 被引用数 (Scopus)

抄録

Highly nitrogenated amorphous carbon films have been prepared by reactive rf-magnetron sputtering using pure N2 or Ar/N2 mixed gases. The nitrogen content measured by Rutherford backscattering spectrometry was 40 at% for pure N2 gas and 35 at% for Ar75%-N225% mixed gas. Oxygen atoms of about 7 at% were also detected. Infrared spectra showed a broad absorption band in the range from 1200 to 1600 cm-1 assigned to the N atoms incorporated in the bonding network of amorphous carbon. They showed an absorption band near 2200 cm-1 assigned to the C=N or N = C = 0 bond, but no trace of the N-H or C-H bond was seen.

本文言語English
ページ(範囲)1465-1468
ページ数4
ジャーナルJapanese journal of applied physics
32
10 A
DOI
出版ステータスPublished - 1993 10
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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