Structural, electrical and optical properties of sputter-deposited Nb-doped TiO2 (TNO) polycrystalline films

Naoomi Yamada, Taro Hitosugi, Ngoc Lam Huong Hoang, Yutaka Furubayashi, Yasushi Hirose, Seiji Konuma, Toshihiro Shimada, Tetsuya Hasegawa

    研究成果: Article査読

    64 被引用数 (Scopus)

    抄録

    Transparent conductive oxide (TCO) films of polycrystalline Nb-doped TiO2 (TNO) were fabricated by post-annealing reactively sputtered amorphous films under H2 atmosphere. Carrier transport properties of the H2-annealed films were found to be strongly dependent on substrate temperature Ts and oxygen content in sputtering atmosphere. A minimum resistivity (ρ) of 9.5 × 10- 4 Ω cm and an average visible transmittance of ∼ 75% were obtained at Ts = RT and oxygen content of 10%. This ρ value is of the same order as those of epitaxial TNO films, indicating that polycrystalline TNO has sufficient potential as a practical TCO suitable for large-area applications.

    本文言語English
    ページ(範囲)5754-5757
    ページ数4
    ジャーナルThin Solid Films
    516
    17
    DOI
    出版ステータスPublished - 2008 7 1

    ASJC Scopus subject areas

    • 電子材料、光学材料、および磁性材料
    • 表面および界面
    • 表面、皮膜および薄膜
    • 金属および合金
    • 材料化学

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