Structural and dielectric properties of anodic oxide film on Nb-Ti alloy

Satoshi Semboshi, Ko ichi Bando, Naofumi Ohtsu, Yonggu Shim, Toyohiko J. Konno

研究成果: Article査読

13 被引用数 (Scopus)

抄録

The structural and dielectric properties of anodic oxide films on Nb and Nb-Ti alloys containing 1, 3, 5, 7, 10 and 15 at.% Ti were investigated. Anodized Nb-Ti alloys were covered with an anodic oxide film containing amorphous and partly crystalline Nb2O5 and TiO2. Increase of the Ti content in the alloy resulted in the increase of the anodic oxide film thickness and the amount of TiO2 in the oxide film, which led to an enhancement of the permittivity and a suppression of the leak current of the anodic oxide film. Therefore, both the capacitance and the leak current of anodized Nb-Ti alloys can be improved by controlling the composition of the alloy.

本文言語English
ページ(範囲)8613-8619
ページ数7
ジャーナルThin Solid Films
516
23
DOI
出版ステータスPublished - 2008 10 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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