Strain distribution around a NiSi 2 /Si interface measured by convergent beam electron diffraction

Yutaka Wakayama, Shun Ichiro Tanaka

研究成果: Article査読

3 被引用数 (Scopus)

抄録

The lattice strain distribution in a Si (001) substrate around NiSi 2 island is measured using convergent beam electron diffraction (CBED) over a submicron area. Lower symmetric CBED patterns are observed near the interface, demonstrating that compressing and tensile strains are distributed around NiSi 2 islands. The magnitude of the lattice strains, estimated by comparing the measurements with calculated CBED patterns, was found to be in the range of about 0.1 to 0.4%. Strain singularities were observed at NiSi 2 island corners and attributed to a sum of certain stress components. This feature of the strain distribution is thought to be related to the shape and dimensions of the NiSi 2 islands.

本文言語English
ページ(範囲)285-288
ページ数4
ジャーナルApplied Surface Science
117-118
DOI
出版ステータスPublished - 1997 6月 2
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 物理学および天文学(全般)
  • 表面および界面
  • 表面、皮膜および薄膜

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