抄録
The lattice strain distribution in a Si (001) substrate around NiSi 2 island is measured using convergent beam electron diffraction (CBED) over a submicron area. Lower symmetric CBED patterns are observed near the interface, demonstrating that compressing and tensile strains are distributed around NiSi 2 islands. The magnitude of the lattice strains, estimated by comparing the measurements with calculated CBED patterns, was found to be in the range of about 0.1 to 0.4%. Strain singularities were observed at NiSi 2 island corners and attributed to a sum of certain stress components. This feature of the strain distribution is thought to be related to the shape and dimensions of the NiSi 2 islands.
本文言語 | English |
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ページ(範囲) | 285-288 |
ページ数 | 4 |
ジャーナル | Applied Surface Science |
巻 | 117-118 |
DOI | |
出版ステータス | Published - 1997 6月 2 |
外部発表 | はい |
ASJC Scopus subject areas
- 化学 (全般)
- 凝縮系物理学
- 物理学および天文学(全般)
- 表面および界面
- 表面、皮膜および薄膜