Strain distribution around a NiSi 2 /Si interface measured by convergent beam electron diffraction

Yutaka Wakayama, Shun Ichiro Tanaka

研究成果: Article査読

3 被引用数 (Scopus)

抄録

The lattice strain distribution in a Si (001) substrate around NiSi 2 island is measured using convergent beam electron diffraction (CBED) over a submicron area. Lower symmetric CBED patterns are observed near the interface, demonstrating that compressing and tensile strains are distributed around NiSi 2 islands. The magnitude of the lattice strains, estimated by comparing the measurements with calculated CBED patterns, was found to be in the range of about 0.1 to 0.4%. Strain singularities were observed at NiSi 2 island corners and attributed to a sum of certain stress components. This feature of the strain distribution is thought to be related to the shape and dimensions of the NiSi 2 islands.

本文言語English
ページ(範囲)285-288
ページ数4
ジャーナルApplied Surface Science
117-118
DOI
出版ステータスPublished - 1997 6 2
外部発表はい

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

フィンガープリント 「Strain distribution around a NiSi <sub>2</sub> /Si interface measured by convergent beam electron diffraction」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル