STM study of C2H2 adsorption on Si(100)

Craig Tindall, Lian Li, Osamu Takaoka, Yukio Hasegawa, Toshio Sakurai

    研究成果: Article査読

    抄録

    The adsorption of C2H2 on Si(100)2×1 has been studied for the first time using STM. Upon exposure of the sample at room temperature to 0.2L C2H2 (approximately 20% coverage) adsorption of the molecule on alternate dimer pairs is observed, leading to either a local 2×2 or c(2×4) structure. In the filled state image, a local minimum is observed in the center of the reacted dimer pairs, while the unreacted dimer pairs maintain the normal bean shaped contour of the clean surface. Upon annealing the substrate at 775K, the surface becomes disordered and the steps are no longer visible. After further annealing at 875K, SiC clusters are formed and the 2×1 structure is again seen between the clusters. Annealing to higher temperatures around 1100K leads to pinning of the step movement by the SiC clusters. We find that at saturation coverage, the molecule forms a well-ordered 2×2 overlayer on the surface. Annealing to intermediate temperatures below 900K leads to results similar to that seen for lower coverages. However, annealing at 1100K results in facetting of the surface. Annealing at 1275K creates anisotropic facets which are oriented along the 110 direction with a typical aspect ratio of approximately four to five. These facets act as nucleation sites for subsequent carbonization and SiC growth.

    本文言語English
    ページ(範囲)63-65
    ページ数3
    ジャーナルScience Reports of the Rerearch Institutes Tohoku University Series A-Physics
    44
    1
    出版ステータスPublished - 1997 12 1

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Metals and Alloys

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