Sterilization of Escherichia coli by a coaxial microwave plasma flow

Takehiko Sato, Akiko Doi, Takuya Urayama, Tatsuyuki Nakatani, Takashi Miyahara

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

An atmospheric low temperature plasma flow generated by microwave discharge utilizing a coaxial cable for microwave transmission has some advantages such as portability, simple configuration, and low power operation. It mainly consists of a cavity, a quartz discharge tube, a coaxial cable, a microwave power source and a gas supply system. Using this argon plasma source, we investigated to clarify effects of exposure temperature, exposure time, exposure distance, input power and gas flow rate on the number of surviving cells of Escherichia coli. A log reduction number of E. coli of at least 3 (10 -3) was obtained at exposure temperatures of 353 K when the exposure time was 600 seconds with a gas flow rate of 5 Sl/min and an input power of 400 W. Number of surviving cells decreases with increase of exposure time in any sterilization conditions.

本文言語English
ホスト出版物のタイトルConference Record of the 2005 IEEE Industry Applications Conference, 40th IAS Annual Meeting
出版社Institute of Electrical and Electronics Engineers Inc.
ページ767-770
ページ数4
ISBN(印刷版)0780392086, 0780392086, 9780780392083
DOI
出版ステータスPublished - 2005
イベント2005 IEEE Industry Applications Conference, 40th IAS Annual Meeting - Kowloon, Hong Kong, China
継続期間: 2005 10月 22005 10月 6

出版物シリーズ

名前Conference Record - IAS Annual Meeting (IEEE Industry Applications Society)
2
ISSN(印刷版)0197-2618

Other

Other2005 IEEE Industry Applications Conference, 40th IAS Annual Meeting
国/地域China
CityKowloon, Hong Kong
Period05/10/205/10/6

ASJC Scopus subject areas

  • 制御およびシステム工学
  • 産業および生産工学
  • 電子工学および電気工学

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