This paper discusses the nano-interface between an aluminum alloy (A5052) substrate and diamond-like carbon (DLC) film prepared by a hybrid process of plasma-based ion implantation and deposition (PBIID) using superimposed RF and negative high-voltage pulses. Adhesion strength of DLC films were enhanced by carbon ion implantation to the substrate. The nano-interface between DLC film and substrate was observed by high resolution transmission electron microscopy (HRTEM) and scanning transmission electron microscopy (STEM) and analyzed by energy dispersive X-ray spectroscopy (EDS). It was found that an unclear crystal structure damaged by ion implantation was formed in the carbon ion-implanted layer. Besides, the amorphous mixing layer of oxide and DLC was produced on the substrate surface. The formation of the mixing layer, the layer of unclear crystal structure and the destruction of oxide led to the enhancement in adhesion strength of DLC film.
|ジャーナル||Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms|
|号||1-2 SPEC. ISS.|
|出版ステータス||Published - 2007 4|
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