We have demonstrated a novel procedure for fabricating high-κ dielectric nanofilms by using a titania nanosheet as a building block. The layer-by-layer assembly of titania nanosheets using an atomically flat SrRuO3 substrate is advantageous as a means of fabricating atomically uniform multilayer high-κ nanofilms. High-resolution transmission electron microscopy revealed that these multilayer nanofilms are composed of a well-ordered lamellar structure without an interfacial dead layer. These nanofilms exhibited both high dielectric constant (εr ∼ 125) and low leakage current density (J < 10-7A/cm2) even for thicknesses as low as 10nm. These results indicate that the titania nanosheet is a very promising candidate as a high-κ nanoblock, and its bottom-up fabrication provides new opportunities for the development of high-κ devices.
|ジャーナル||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|出版ステータス||Published - 2007 10 22|
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