Size analysis of ethanol cluster ions and their sputtering effects on solid surfaces

G. H. Takaoka, K. Nakayama, T. Okada, M. Kawashita

研究成果: Conference contribution

3 被引用数 (Scopus)

抄録

When vapors of liquid materials such as ethanol were ejected through a nozzle into a vacuum region, ethanol clusters were produced at the vapor pressures larger than 1 atm. The cluster size measured by the TOF method was distributed between a few hundreds and a few thousands, which was different depending on the vapor pressure. Several kinds of solid surfaces such as Si(100) and metal surfaces were irradiated at different acceleration voltages with ethanol cluster ion beams, and chemical and physical sputtering with a high sputtering yield was achieved. In addition, the sputtered surfaces were very flat at an atomic level. The dependence of the sputtered depth on the incident angle of the ethanol cluster ion beams was investigated for the Si(100) surfaces. The sputtered depth had a peak value at an incident angle less than 60 degrees, and the incident angle corresponding to the peak value decreased with decreasing acceleration voltage.

本文言語English
ホスト出版物のタイトルION IMPLANTATION TECHNOLOGY
ホスト出版物のサブタイトル16th International Conference on Ion Implantation Technology, IIT 2006
出版社American Institute of Physics Inc.
ページ321-324
ページ数4
ISBN(印刷版)0735403651, 9780735403659
DOI
出版ステータスPublished - 2006
イベントION IMPLANTATION TECHNOLOGY: 16th International Conference on Ion Implantation Technology, IIT 2006 - Marseille, France
継続期間: 2006 6 112006 11 16

出版物シリーズ

名前AIP Conference Proceedings
866
ISSN(印刷版)0094-243X
ISSN(電子版)1551-7616

Other

OtherION IMPLANTATION TECHNOLOGY: 16th International Conference on Ion Implantation Technology, IIT 2006
CountryFrance
CityMarseille
Period06/6/1106/11/16

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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