TY - JOUR
T1 - Simulation on surface roughness variation of Au thin films by microwave post annealing
AU - Yoshikawa, Noboru
AU - Igarashi, Takeru
N1 - Funding Information:
The author is grateful for the financial supports for conducting the study by Grant in Aid for Challenging Exploratory Research: 16K14433 by JSPS and by Fujikura Foundation. The authors are grateful to helpful advice in programing by Dr. Joe Yoshikawa.
Publisher Copyright:
© 2021
PY - 2021/11/1
Y1 - 2021/11/1
N2 - A simulation study was performed in order to interpret the experimental results in the previous report on roughness reduction in Au thin films by microwave post annealing in comparison with an electric furnace. The simulation model of this study is based on one-dimensional capillary driven surface diffusion with incorporation of electromigration force due to microwave irradiation. It was shown that alternating microwave electric field does not cancel the atomic migration completely, because of the capillary driven (thermal) effects simultaneously occurring within the alternation period, but is not adequate to account for the variation of the film profiles and the observed wave number spectra. In this study, capillary model was applied to the furnace annealing, and an anisotropic factor in atomic transport by electromigration was introduced in microwave annealing simulations. We reproduced the profiles and spectra changes observed in the experiments by both annealing methods.
AB - A simulation study was performed in order to interpret the experimental results in the previous report on roughness reduction in Au thin films by microwave post annealing in comparison with an electric furnace. The simulation model of this study is based on one-dimensional capillary driven surface diffusion with incorporation of electromigration force due to microwave irradiation. It was shown that alternating microwave electric field does not cancel the atomic migration completely, because of the capillary driven (thermal) effects simultaneously occurring within the alternation period, but is not adequate to account for the variation of the film profiles and the observed wave number spectra. In this study, capillary model was applied to the furnace annealing, and an anisotropic factor in atomic transport by electromigration was introduced in microwave annealing simulations. We reproduced the profiles and spectra changes observed in the experiments by both annealing methods.
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U2 - 10.1016/j.tsf.2021.138939
DO - 10.1016/j.tsf.2021.138939
M3 - Article
AN - SCOPUS:85115889584
VL - 737
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
M1 - 138939
ER -