Simulation of vacancy migration energy in Cu under high strain

K. Sato, T. Yoshiie, Y. Satoh, Q. Xu, M. Kiritani

研究成果: Article査読

26 被引用数 (Scopus)

抄録

The activation energy for the migration of vacancies in Cu under high strain was calculated by computer simulation using static methods. The migration energy of vacancies was 0.98 eV in the absence of deformation. It varied with the migration direction and stress direction because the distance between a vacancy and its neighboring atoms changes by deformation. For example, the migration energy for the shortest migration distance was reduced to 9.6 and 39.4% of its initial value by 10% compression and 20% elongation, respectively, while that for the longest migration distance was raised to 171.7 by 20% elongation. If many vacancies are created during high-speed deformation, the lowering of migration energy enables vacancies to escape to sinks such as surfaces, even during the shorter deformation period. The critical strain rate above which the strain rate dependence of vacancy accumulation ceases to exist increases with the lowering of vacancy migration energy.

本文言語English
ページ(範囲)220-222
ページ数3
ジャーナルMaterials Science and Engineering A
350
1-2
DOI
出版ステータスPublished - 2003 6月 15

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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