Simple methods for site-controlled carbon nanotube growth using radio-frequency plasma-enhanced chemical vapor deposition

G. H. Jeong, N. Satake, Toshiaki Kato, T. Hirata, R. Hatakeyama, Kazuyuki Tohji

研究成果: Article査読

15 被引用数 (Scopus)

抄録

We demonstrate the validity of very simple methods for site-controlled carbon nanotube growth using a radio-frequency magnetron-type plasma-enhanced chemical vapor deposition technique. Enhanced plasma density and optimized ion-bombardment energy achieved by magnetic field introduction are found to be responsible for the uniform and well-aligned carbon nanotube growth. Based on these results, we attempted to perform experiments on site-controlled carbon nanotube growth using very convenient methods such as scratching or simply masking a substrate surface where carbonaceous materials deposit.

本文言語English
ページ(範囲)85-87
ページ数3
ジャーナルApplied Physics A: Materials Science and Processing
79
1
DOI
出版ステータスPublished - 2004 6月 1

ASJC Scopus subject areas

  • 化学 (全般)
  • 材料科学(全般)

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