Self-assembly of very-low height/width aspect-ratio Li3Ni2NbO6 disks embedded in Li3NbO4 epitaxial films

Hideyuki Kawasoko, Ryouta Shimizu, Yoshitaka Takagi, Kuniko Yamamoto, Issei Sugiyama, Susumu Shiraki, Taro Hitosugi

研究成果: Article査読

1 被引用数 (Scopus)

抄録

We here report the self-assembly of Li3Ni2NbO6 (LNNO) epitaxial disks with very low height/width aspect ratios. An epitaxial LNNO thin film is obtained at a substrate temperature (Ts) of 400 °C, using a pulsed laser deposition technique, and by increasing the Ts to 600 °C, Li3NbO4 epitaxial domains are formed inside the LNNO epitaxial film. Further increasing the Ts to 700 °C leads to the formation of LNNO disks (with diameters of a few micrometers and a typical height of ~ 100 nm) embedded in a Li3NbO4 film. Interestingly, transmission electron microscopy observations reveal that the LNNO disks are separated from the Li3NbO4 films by amorphous compounds, indicating the formation of a planar core-shell structure. Understanding of the growth processes of these unique nanostructures pave the way to fabrication of higher hierarchical structures embedded in thin film matrices.

本文言語English
ページ(範囲)202-206
ページ数5
ジャーナルThin Solid Films
621
DOI
出版ステータスPublished - 2017 1月 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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