Selection of Di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography

Masaru Nakagawa, Kei Kobayashi, Azusa N. Hattori, Shunya Ito, Nobuya Hiroshiba, Shoichi Kubo, Hidekazu Tanaka

研究成果: Article › 査読