Selection of Di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography

Masaru Nakagawa, Kei Kobayashi, Azusa N. Hattori, Shunya Ito, Nobuya Hiroshiba, Shoichi Kubo, Hidekazu Tanaka

    研究成果: Article査読

    19 被引用数 (Scopus)

    抄録

    We used fluorescence microscopy to show that low adsorption of resin components by a mold surface was necessary for continuous ultraviolet (UV) nanoimprinting, as well as generation of a low release energy on detachment of a cured resin from a template mold. This is because with low mold pollution, fracture on demolding occurred at the interface between the mold and cured resin surfaces rather than at the outermost part of the cured resin. To achieve low mold pollution, we investigated the radical photopolymerization behaviors of fluorescent UV-curable resins and the mechanical properties (fracture toughness, surface hardness, and release energy) of the cured resin films for six types of di(meth)acrylate-based monomers with similar chemical structures, in which polar hydroxy and aromatic bulky bisphenol moieties and methacryloyl or acryloyl reactive groups were present or absent. As a result, we selected bisphenol A glycerolate dimethacrylate (BPAGDM), which contains hydroxy, bisphenol, and methacryloyl moieties, which give good mechanical properties, monomer bulkiness, and mild reactivity, respectively, as a suitable base monomer for UV nanoimprinting under an easily condensable alternative chlorofluorocarbon (HFC-245fa) atmosphere. The fluorescent UV-curable BPAGDM resin was used for UV nanoimprinting and lithographic reactive ion etching of a silicon surface with 32 nm line-and-space patterns without a hard metal layer.

    本文言語English
    ページ(範囲)4188-4195
    ページ数8
    ジャーナルLangmuir
    31
    14
    DOI
    出版ステータスPublished - 2015 4 14

    ASJC Scopus subject areas

    • 材料科学(全般)
    • 凝縮系物理学
    • 表面および界面
    • 分光学
    • 電気化学

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