Scanning tunneling microscopy of N2H4 on silicon surfaces

C. Tindall, L. Li, O. Takaoka, Y. Hasegawa, T. Sakurai

研究成果: Article査読

9 被引用数 (Scopus)

抄録

The chemistry of N2H4 on Si(100)2 × 1 and Si(111)7 × 7 has been studied using scanning tunneling microscopy. At low coverages on Si(100)2 × 1 at room temperature the adsorption sites are distributed randomly on the surface and are imaged as dark spots in the dimer row by the STM. Upon annealing the substrate at 600 K, both isolated reaction products, as well as clusters of reaction products are formed on the surface. The STM images show that the majority of the isolated reaction products are adsorbed symmetrically across the dimers. Based on previous HREELS data, these are most likely NHx groups. However, the clusters are not well resolved. Because of this we speculate that they are not simply symmetrically adsorbed NHx groups, but likely have a more complicated internal structure. At higher coverages, the STM images show that the predominant pathway for adsorption is with the N-N bond parallel to the surface, in agreement with HREELS studies of this system. On Si(111)7 × 7, the molecule behaves in a manner which is similar to NH3. That is, at low coverages the molecule adsorbs preferentially at center adatoms due to the greater reactivity of these sites, while at higher coverages it also reacts with the corner adatoms.

本文言語English
ページ(範囲)481-488
ページ数8
ジャーナルSurface Science
380
2-3
DOI
出版ステータスPublished - 1997 5 15
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

フィンガープリント

「Scanning tunneling microscopy of N<sub>2</sub>H<sub>4</sub> on silicon surfaces」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル