RF magnetron sputtered aluminium oxide coatings on iridium

K. Mumtaz, J. Echigoya, H. Enoki, T. Hirai, Y. Shindo

研究成果: Article査読

9 被引用数 (Scopus)

抄録

The effects of process parameters on the microstructural morphology of aluminium oxide (Al2O3) coatings on Ir have been studied. Al2O3 coatings were deposited on Ir-coated isotropic graphite (IG) substrates at substrate temperatures of room temperature (RT)-1073 K, RF power of 200-600 W in an Ar, or Ar + 1-10% O2, sputtering gas atmosphere by RF magnetron sputtering. Al2O3 coatings which were deposited at high substrate temperatures and high RF powers in an Ar, or an Ar + O2, sputtering gas atmosphere were found to contain a dense, fine columnar structure with a γ-Al2O3 phase, low Ar content and a relatively high hardness value of ca. 1050 Hv. Furthermore, high resolution transmission electron microscopy (HRTEM) results revealed the epitaxial growth of Al2O3 coatings on Ir-coated IG substrate. It was found that the interface between Al2O3 and Ir coatings was sharp and Al2O3 coatings remained intact with the Ir-coated IG substrate.

本文言語English
ページ(範囲)5247-5256
ページ数10
ジャーナルJournal of Materials Science
31
19
DOI
出版ステータスPublished - 1996 1 1

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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